Squeeze info from every photon! Control micro- to nano-scale device fabrication like the world’s leaders - using state-of the art optical metrology systems from n&k Technology. In-line metrology for high-volume manufacturing (HVM) of discrete and integrated circuit (IC) semiconductors, CMOS Image Sensors, MEMS, photomasks, hard-disk drives, solar cells, and flat panel displays. Thickness systems quantify n- and k-spectra, and band-gaps of ultra-thin to ultra-thick multi-layer deposited stacks, and of epi-silicon, SOI, and GaN-on-Si. Scatterometer systems for Optical Critical Dimension (OCD) control of small- to large-pitch complex patterns including deep trenches, contact holes, and high aspect-ratio 3D structures in advanced devices. n&k Technology was founded by Drs. Rahim Forouhi and Iris Bloomer in California in 1992, to provide state-of-the-art optical metrology tools and support services: The broadest DUV-Vis-IR broadband spectrophotometry using patented reflective optics, Our founders derived the Forouhi-Bloomer equations and built the core software, Applications knowledge from >30 years of dedication to industrial metrology, and Field-proven, production-worthy, fast, and non-destructive patterning process control. If you can make it, we can measure it. www.nandk.com